Sputtertech 4451 Sputter System featuring up to 3 Delta-shaped cathodes or 4 circular 8-inch cathodes, compatible with substrates up to 8 inches, supports DC, RF, and Pulsed DC sputtering, includes monitor, keyboard, and user manuals.
Category: Sputtering System (Vacuum Deposition Tool)
Make: Sputtertech Inc.
Model: 4451 Sputter System
Type/Process: Thin Film Physical Vapor Deposition (PVD) Sputter System
Chamber Type/Material: Stainless Steel Vacuum Chamber
Number of Sputter Targets: Up to 3 Delta-shaped cathodes or 4 circular 8-inch cathodes
Target Size/Material Compatibility: Compatible with 8-inch targets; materials include metals, oxides, nitrides
Substrate Size: Up to 8 inches