Trion Technology Reactive Ion Etcher (RIE) featuring a touchscreen interface, supports process gases including CF₄, CHF₃, SF₆, O₂, Ar, BCl₃, Cl₂, H₂, CH₄, and He, equipped with a 13.56 MHz RF generator, approximate dimensions 30” x 28” x 65” (76 x 71 x 165 cm), Serial No. RIT.10.9451.
Category: Reactive Ion Etcher (RIE)
Make: Trion Technology
Model: Not explicitly identified; possible models include Phantom III, Oracle III, or Minilock III
Serial Number: RIT.10.9451
Chamber Size / Wafer Size Capability: Supports wafers up to 200 mm (8 inches) in diameter
Process Gases Supported: CF₄, CHF₃, SF₆, O₂, Ar, BCl₃, Cl₂, H₂, CH₄, He