Tamarack Scientific 303 and 900-001 CPX Photolithography Systems, featuring i-line (365 nm) mercury lamp, up to 100 mm x 100 mm exposure area, ±1 µm alignment accuracy, integrated air handling/ventilation system, US Patents 5,480,816; 5,559,629; 5,330,516.
Category: Photolithography Scanning Projection/Production Exposure System
Make: Tamarack Scientific Co., Inc.
Model: 303 (Scanning Projection System), 900-001 CPX (Projection Exposure System)
Serial Number: 303-0003 (for Scanning Projection), 900-001 (for Production Exposure)
System Application: Photolithography Stepper/Aligner
Substrate Size Supported: Up to 6-inch (150 mm) wafers